모든 IVT KOREA의 고성능 멀티 코팅기는 고객 주문형으로도 선택이 가능하며, 고객의 선택 사양에 IVT KOREA의 기술을 접목하여 균일하고 안정적인 초정밀 코팅이 가능한 시스템을 설계합니다.
언제든 문의주세요.
적용범위
Glasses AR + AF
AF, IF
BBAR
RX Lens
Color Filter
Optical Dichroic Filter
Band Pass Filter
Metal Mirror
IR Filter
사양
| CHAMBER SIZE | Ø600 X H720 | |
|---|---|---|
| Low Pumping System | Rotary Pump |
E2M80T (50Hz) 80m3h-1/47.1ft3min-1 (60Hz) 96m3h-1/56.5ft3min-1 |
| Booster Pump |
EH500C (50Hz) 505m3h-1/300ft3min-1 (60Hz) 605m3h-1/335ft3min-1 |
|
| High Pumping System | Turbo Pump |
N2 3800(L/s) Max H2 2200(L/s) x 1EA |
| Meissner Trap |
Polycold / Cool -140°C 2 min |
|
| Ion Beam Source | Up to 40~350V and 15A(Ar and O2) | |
| Electron Beam Source | 10kV / 1000mA / 270° / 4~32 Pocket | |
| Substrate Fixture | Optional : Single, Segment Dome(3/4) | |
| Substrate Heating | Halogen Heater Up to 250°C | |
| Deposition Control |
XTC3S (6 MHz Single Head) IC6 (6 MHz SIX Head) |
|
| Optical Thickness Monitoring(optional) | OPM | |
| Vacuum Gauge |
High Vacuum 1SET Low Vacuum 2SET |
|
| Control System | AIT (Process Control & Monitor -PC System (24Inch Touch) | |
| CHAMBER SIZE | Ø900 X H 980 | |
|---|---|---|
| Low Pumping System | Rotary Pump |
E2M175 (50Hz) 178m3h-1/105ft3min-1 (60Hz) 214m3h-1/126ft3min-1 |
| Booster Pump |
EH500C (50Hz) 505m3h-1/300ft3min-1 (60Hz) 605m3h-1/335ft3min-1 |
|
| High Pumping System | Turbo Pump |
N2 4200(L/s) Max H2 2800(L/s) x 1EA |
| Meissner Trap |
Polycold / Cool -140°C 2 min |
|
| Ion Beam Source | Up to 40~350V and 15A(Ar and O2) | |
| Electron Beam Source | 10kV / 1000mA / 270° / 4~32 Pocket | |
| Substrate Fixture | Optional : Single, Segment Dome(3/4) | |
| Substrate Heating | Halogen Heater Up to 250°C | |
| Deposition Control |
XTC3S (6 MHz Single Head) IC6 (6 MHz SIX Head) |
|
| Optical Thickness Monitoring(optional) | OPM | |
| Vacuum Gauge |
High Vacuum 1SET Low Vacuum 2SET |
|
| Control System | AIT (Process Control & Monitor -PC System (24Inch Touch) | |
| CHAMBER SIZE | Ø1200 X H 1430 | |
|---|---|---|
| Low Pumping System | Rotary Pump |
E2M275 (50Hz) 292m3h-1/172ft3min-1 (60Hz) 350m3h-1/206ft3min-1 |
| Booster Pump |
EH1200 (50Hz) 1,195m3h-1/175ft3min-1 (60Hz) 1,435m3h-1/845ft3min-1 |
|
| High Pumping System | Turbo Pump |
N2 4200(L/s) Max H2 2800(L/s) x 2EA |
| Meissner Trap |
Polycold / Cool -140°C 2 min |
|
| Ion Beam Source | Up to 40~350V and 15A(Ar and O2) | |
| Electron Beam Source | 10kV / 1000mA / 270° / 4~32 Pocket | |
| Substrate Fixture | Optional : Single, Segment Dome(3/4) | |
| Substrate Heating | Halogen Heater Up to 250°C | |
| Deposition Control |
XTC3S (6 MHz Single Head) IC6 (6 MHz SIX Head) |
|
| Optical Thickness Monitoring(optional) | OPM | |
| Vacuum Gauge |
High Vacuum 1SET Low Vacuum 2SET |
|
| Control System | AIT (Process Control & Monitor -PC System (24Inch Touch) | |
| CHAMBER SIZE | Ø1350 X H1430 | |
|---|---|---|
| Low Pumping System | Rotary Pump |
E2M275 (50Hz) 292m3h-1/172ft3min-1 (60Hz) 350m3h-1/206ft3min-1 |
| Booster Pump |
EH1200 (50Hz) 1,195m3h-1/175ft3min-1 (60Hz) 1,435m3h-1/845ft3min-1 |
|
| High Pumping System | Turbo Pump |
N2 4200(L/s) Max H2 2800(L/s) x 3EA |
| Meissner Trap |
Polycold / Cool -140°C 2 min |
|
| Ion Beam Source | Up to 40~350V and 15A(Ar and O2) | |
| Electron Beam Source | 10kV / 1000mA / 270° / 4~32 Pocket | |
| Substrate Fixture | Optional : Single, Segment Dome(3/4) | |
| Substrate Heating | Halogen Heater Up to 250°C | |
| Deposition Control |
XTC3S (6 MHz Single Head) IC6 (6 MHz SIX Head) |
|
| Optical Thickness Monitoring(optional) | OPM | |
| Vacuum Gauge |
High Vacuum 1SET Low Vacuum 2SET |
|
| Control System | AIT (Process Control & Monitor -PC System (24Inch Touch) | |
